Extreme Ultraviolet Lithography Coordination Committee

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• TWG

* Need access? Send mail to either Rob Willoner or Yumiko Takamori

To coordinate collaboration among world EUVL (Extreme Ultraviolet Lithography) consortia
- Align R&D activities to the International Technology Roadmap for Semiconductors (ITRS)
- Coordinate R&D collaboration activities among consortia
- Manage knowledge of EUVL IP
To encourage coordination among suppliers
- Share progress reports
To identify implementation issues
- Identify potential "show stoppers" for EUVL implementation
- Communicate implementation issues (e.g., to consortia, IC manufacturers, suppliers, and governments)